The Nano Tungsten Thin Film and its Contacting Property with Aluminium Electrodes

Autor:	Jin Wen Zhang, Yu Feng Jin, Wei Liang
Rok vydání:	2014
Předmět:	Resistive touchscreen Materials science General Engineering chemistry.chemical_element Sputter deposition Tungsten Surface micromachining chemistry Electrical resistivity and conductivity Electrode Electronic engineering Thin film Composite material Ohmic contact
Zdroj:	Advanced Materials Research. 1082:455-458
ISSN:	1662-8985
DOI:	10.4028/www.scientific.net/amr.1082.455
Popis:	In this paper we report nanothickness tungsten (W) thin films with nanoscale thickness prepared by DC magnetron sputtering. Three kinds of samples were realized using micromachining technology, including two-wire and four-wire terminal configurations and only Al electrodes. Using four-wire terminal method, we studied on the electrical property of W film and the contacting resistance between W film and Al electrode. The results show that our as-deposited W film is β-W crystal structure and exhibits good resistive property. Al formed a good ohmic contact with W films. Both the resistivity of W film and the contacting resistance declined nearly linearly with the thickness increasing.
Databáze:	OpenAIRE
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