Processing, properties, and reliability of electroplated lead-free solder bumps

Autor: J. Yoshioka, Rei Kiumi, Fumio Kuriyama, M. Shimoyama, Nobutoshi Saito
Rok vydání: 2003
Předmět:
Zdroj: ITherm 2002. Eighth Intersociety Conference on Thermal and Thermomechanical Phenomena in Electronic Systems (Cat. No.02CH37258).
DOI: 10.1109/itherm.2002.1012552
Popis: Eutectic tin-silver (Sn-Ag), tin-copper (Sn-Cu), and tin-silver-copper (Sn-Ag-Cu) solder alloys are potential lead-free materials for low-temperature processing of solder bumps on wafers. But, before they can be adopted to replace the existing lead-free materials, processes have to be developed to provide controls over composition, height and shape uniformity, and defect formation, such as micro-voids, which are detrimental to bump reliability. Over the last six years, we have developed an electroplating technology using a dip-plating machine for processing the three types of eutectic lead-free solder bumps on silicon wafer. Our process is suitable for mass production with well-controlled bump geometry and composition, and uniformity within 10% over the entire wafer. In this paper, we will describe our process and present our results on the bump properties, such as composition, melting point, and microstructure of the bumps.
Databáze: OpenAIRE