Theoretical study for aerial image intensity in resist in high numerical aperture projection optics and experimental verification with one-dimensional patterns
| Autor: | Akira Takada, Masato Shibuya, Toshiharu Nakashima |
|---|---|
| Rok vydání: | 2016 |
| Předmět: |
Diffraction
Plane wave Image processing 02 engineering and technology 01 natural sciences law.invention 010309 optics Optics law 0103 physical sciences Electrical and Electronic Engineering Aerial image Physics business.industry Mechanical Engineering Scalar (physics) Image plane 021001 nanoscience & nanotechnology Condensed Matter Physics Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials Resist Computer Science::Computer Vision and Pattern Recognition Photolithography 0210 nano-technology business |
| Zdroj: | Journal of Micro/Nanolithography, MEMS, and MOEMS. 15:021206 |
| ISSN: | 1932-5150 |
| DOI: | 10.1117/1.jmm.15.2.021206 |
| Popis: | In optical lithography, high-performance exposure tools are indispensable to obtain not only fine patterns but also preciseness in pattern width. Since an accurate theoretical method is necessary to predict these values, some pioneer and valuable studies have been proposed. However, there might be some ambiguity or lack of consensus regarding the treatment of diffraction by object, incoming inclination factor onto image plane in scalar imaging theory, and paradoxical phenomenon of the inclined entrance plane wave onto image in vector imaging theory. We have reconsidered imaging theory in detail and also phenomenologically resolved the paradox. By comparing theoretical aerial image intensity with experimental pattern width for one-dimensional pattern, we have validated our theoretical consideration. |
| Databáze: | OpenAIRE |
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