Study of Nanosecond Laser Annealing on Silicon Doped Hafnium Oxide Film Crystallization and Capacitor Reliability
Autor: | Ali, Tarek Nadi Ismail, Revello Olivo, Ricardo Orlando, Kerdiles, S., Lehninger, David, Lederer, Maximilian, De, Sourav, Royet, A.-S., Sünbül, Ayse, Prabhu, Aditya, Kühnel, Kati, Czernohorsky, Malte, Rudolph, Matthias, Hoffmann, Raik |
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Rok vydání: | 2022 |
DOI: | 10.24406/h-429204 |
Databáze: | OpenAIRE |
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