Improved Plasma Resistance for Porous Low-k Dielectrics by Pore Stuffing Approach

Autor:	Ziad el Otell, Yiting Sun, Liping Zhang, Mikhail R. Baklanov, Felim Vajda, Markus Heyne, A I Zotovich, Sergej Naumov, Jean-Francois de Marneffe, Stefan De Gendt
Rok vydání:	2014
Předmět:	Materials science Dielectric Plasma Composite material Porosity Electronic Optical and Magnetic Materials
Zdroj:	ECS Journal of Solid State Science and Technology. 4:N3098-N3107
ISSN:	2162-8777 2162-8769
DOI:	10.1149/2.0121501jss
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::b7d714804779ca1146cb7d7181d4a435 https://doi.org/10.1149/2.0121501jss Zobrazit plný text záznamu