Surface layer formed by shock retardation of a pulsed copper plasma flow at a flat obstacle

Autor:	A. V. Kolesnik, V. B. Mikhailov, A. P. Burmakov
Rok vydání:	1984
Předmět:	Materials science business.industry chemistry.chemical_element Condensed Matter Physics Copper Shock (mechanics) Plasma flow Optics chemistry Obstacle Surface layer Composite material business Spectroscopy
Zdroj:	Journal of Applied Spectroscopy. 41:988-990
ISSN:	1573-8647 0021-9037
DOI:	10.1007/bf00659705
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::b5d6bb91bb5308275ab0c92930396498 https://doi.org/10.1007/bf00659705 Zobrazit plný text záznamu Full text from SpringerLink