AFM and TEM observation of surface morphology of Bi-2223 superconducting thin films by MOCVD
| Autor: | Hirofumi Matsuhata, K Abe, T Yoshizawa, J. Itoh, K. Kajimura, K Nakamura, Kazuhiko Endo |
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| Rok vydání: | 2002 |
| Předmět: |
Fabrication
Materials science business.industry Energy Engineering and Power Technology Chemical vapor deposition Surface finish Condensed Matter Physics Microstructure Electronic Optical and Magnetic Materials Carbon film Transmission electron microscopy Optoelectronics Metalorganic vapour phase epitaxy Electrical and Electronic Engineering Thin film business |
| Zdroj: | Physica C: Superconductivity. :687-691 |
| ISSN: | 0921-4534 |
| DOI: | 10.1016/s0921-4534(02)00832-8 |
| Popis: | Using atomic force microscopy and transmission electron microscopy, we examined the surface morphology of Bi-2223 superconducting thin films grown by metalorganic chemical vapor deposition, which is closely related to the growth mechanism of Bi-2223 films. As a result, we found an anisotropic in-plane growth. The growth rate along the a-axis is larger than that along the b-axis. Finally, we report on the fabrication of c-axis oriented Bi-2223 films with a roughness less than half a unit cell. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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