Ultrathin percolated WO3 cluster film and its resistive response to H2

Autor:	Chung Wo Ong, Jian Xing Huang, Man Hon Wong, Meng Zhao
Rok vydání:	2014
Předmět:	Resistive touchscreen Materials science Hydrogen Mechanical Engineering Metals and Alloys chemistry.chemical_element Nanotechnology Tungsten Nanoclusters chemistry Chemical engineering Mechanics of Materials Oxidizing agent Materials Chemistry Cluster (physics) Thin film Beam (structure)
Zdroj:	Journal of Alloys and Compounds. 612:163-169
ISSN:	0925-8388
Popis:	Thin films composed of tungsten oxide (WO 3 ) nanoclusters were fabricated by oxidizing supersonic cluster beam deposited tungsten films at various temperatures. Oxidation at 700 °C resulted in aggregation of the deposits, forming a percolated network of WO 3 spherical caps connected by fine links. The resistance response of the palladium-(Pd-) coated film sample to hydrogen (H 2 ) was investigated. The response rate was faster than those of other samples oxidized at lower temperatures. This is the result of the rapid electrical switching of the intercluster links between the highly resistive depleted state and conducting hydrogenated state. The possibility of improving the H 2 sensing response rate with the use of the percolated WO 3 film structure is illustrated.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::b1af62feecf7e4f803871134c2f6d5f1 https://doi.org/10.1016/j.jallcom.2014.05.108 Zobrazit plný text záznamu Full Text from ScienceDirect