Production metrology and control of color filter array photolithography for CMOS imagers

Autor: John N. Helbert, Arnold W. Yanof, A. Daou, Cliff I. Drowley, Clive Hayzelden, James P. Annand, M. Pantel, Carlos L. Ygartua
Rok vydání: 1999
Předmět:
Zdroj: SPIE Proceedings.
ISSN: 0277-786X
DOI: 10.1117/12.350821
Popis: The color filter array (CFA) for an image-producing semiconductor device is composed of patterned red-, and green- and blue-colored photoresist structures. CFA photolithography is rather different from that of most semiconductor process levels.
Databáze: OpenAIRE