Production metrology and control of color filter array photolithography for CMOS imagers
Autor: | John N. Helbert, Arnold W. Yanof, A. Daou, Cliff I. Drowley, Clive Hayzelden, James P. Annand, M. Pantel, Carlos L. Ygartua |
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Rok vydání: | 1999 |
Předmět: |
Materials science
genetic structures business.industry Semiconductor device fabrication Computational lithography education technology industry and agriculture Semiconductor device Photoresist equipment and supplies complex mixtures law.invention Metrology Optics CMOS law Optoelectronics Color filter array Photolithography business |
Zdroj: | SPIE Proceedings. |
ISSN: | 0277-786X |
DOI: | 10.1117/12.350821 |
Popis: | The color filter array (CFA) for an image-producing semiconductor device is composed of patterned red-, and green- and blue-colored photoresist structures. CFA photolithography is rather different from that of most semiconductor process levels. |
Databáze: | OpenAIRE |
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