Structural and compositional reversible phase transitions on low-index Fe 3 Si surfaces

Autor:	W. Meier, K. Heinz, J. Schardt, Ulrich Starke, P. L. de Andres, C. Polop, W. Weiss
Rok vydání:	2001
Předmět:	Phase transition Auger electron spectroscopy Materials science Silicon Annealing (metallurgy) General Physics and Astronomy chemistry.chemical_element Epitaxy chemistry.chemical_compound chemistry Electron diffraction Chemical physics Atomic theory Silicide
Zdroj:	Europhysics Letters (EPL). 56:822-828
ISSN:	1286-4854 0295-5075
DOI:	10.1209/epl/i2001-00593-6
Popis:	The (100), (110), and (111) surfaces of Fe3Si have been studied by quantitative Low-Energy Electron Diffraction and Auger Electron Spectroscopy. Reversible phase transitions between the D03 and the CsCl structure develop upon annealing, triggered by a substantial reversible surface segregation of Si. On all surfaces, Si termination is preferred either by realizing a topmost Si layer whenever the choice between Si and Fe exists, or by direct Si occupation of nominal Fe sites. Similarities to epitaxial iron silicide films structural behaviour are identified.
Databáze:	OpenAIRE
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