Study of µDBO overlay target size reduction for application broadening
| Autor: | Florent Dettoni, Christophe Dezauzier, Richard Johannes Franciscus Van Haren, Jerome Depre, R. Bouyssou, Sergey Tarabrin, Clément Massacrier, Victor Calado |
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| Rok vydání: | 2018 |
| Předmět: |
Flexibility (engineering)
Early generation business.industry Computer science Size reduction 02 engineering and technology Overlay 021001 nanoscience & nanotechnology 01 natural sciences Metrology 010309 optics Footprint 0103 physical sciences 0210 nano-technology business Throughput (business) Computer hardware |
| Zdroj: | Metrology, Inspection, and Process Control for Microlithography XXXII. |
| DOI: | 10.1117/12.2297673 |
| Popis: | With these proceedings we present μ-diffraction-based overlay (μDBO) targets that are well below the currently supported minimum size of 10×10 μm2 . We have been capable of measuring overlay targets as small as 4×4 μm2 with our latest generation YieldStar system. Furthermore we find an excellent precision (TMU < 0.33 nm for 6 × 6 μm2 ) without any compromise on throughput (MAM time < 60 ms). At last a study that compares four generations of YieldStar systems show clearly that the latest generation YieldStar systems is much better capable of reading small overlay targets such that the performance of a 16 × 16 μm2 on an early generation YieldStar 2nd-gen is comparable to that of a 8 × 8 μm2 on the latest YieldStar 5th-gen. This work enables a smaller metrology footprint, more placement flexibility and in-die overlay metrology solutions. |
| Databáze: | OpenAIRE |
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