Investigating the Formation of MoSe2 and TiSe2 Films from Artificially Layered Precursors

Autor: Erik C. Hadland, David W. Johnson, Danielle M. Hamann, Aaron M. Miller
Rok vydání: 2020
Předmět:
Zdroj: Inorganic Chemistry. 59:12536-12544
ISSN: 1520-510X
0020-1669
DOI: 10.1021/acs.inorgchem.0c01626
Popis: The reaction of ultrathin layers of Mo and Ti with Se was investigated, and significantly different reaction pathways were found. However, in both systems postdeposition annealing results in smooth...
Databáze: OpenAIRE