Effect of lens aberrations on pattern placement error

Autor:	Richard D. Holscher, Pary Baluswamy
Rok vydání:	2000
Předmět:	Computer science Zernike polynomials business.industry Design of experiments ComputingMethodologies_IMAGEPROCESSINGANDCOMPUTERVISION ComputerApplications_COMPUTERSINOTHERSYSTEMS Overlay law.invention Lens (optics) symbols.namesake Optics law symbols Projection lens business
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.388966
Popis:	Projection lens aberrations are typically modeled with Zernike polynomial coefficients. In this paper significant aberration terms that affect pattern placement error are identified using Design of Experiments. Simple models are developed for various 1D and 2D mask structures. These are used to study the impact of different illumination and aberration conditions. The results are used to estimate the impact of projection lens aberrations on overlay error.
Databáze:	OpenAIRE
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