Influence of an r.f. plasma on the optical and structural properties of vacuum-deposited dielectric coatings
| Autor: | H.-G. Lotz, W.-D. Münz, H. Vogt, J. Müller, R. Herrmann |
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| Rok vydání: | 1985 |
| Předmět: |
business.industry
Scanning electron microscope Metals and Alloys Analytical chemistry chemistry.chemical_element Germanium Surfaces and Interfaces Substrate (electronics) Sputter deposition Evaporation (deposition) Surfaces Coatings and Films Electronic Optical and Magnetic Materials Optics Vacuum deposition chemistry Aluminium Materials Chemistry Thin film business |
| Zdroj: | Thin Solid Films. 127:351-364 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/0040-6090(85)90204-4 |
| Popis: | SiO and TiO films, deposited at different substrate temperatures, were compared using the following coating processes: reactive evaporation of SiO and TiO from a boat with the assistance of an r.f.-induced plasma; r.f. magnetron sputtering of a quartz target; conventional reactive and non-reactive evaporation of SiO and TiO from a boat and quartz from an electron beam evaporator. The stoichiometry of the SiO films was qualitatively determined by studying the IR absorption bands of SiO films deposited onto germanium substrates. The relative water content inside the films was measured using the water absorption band at 2.96 μm. The packing density was calculated from the change in refractive index due to water sorption into the film after exposure to air through venting. Corrosion tests were made with SiO protective layers on aluminium films. The spectral shift of narrow-band-pass filters consisting of SiO/TiO layers was compared with that of conventionally evaporated narrow-bandpass filters. |
| Databáze: | OpenAIRE |
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