Prediction of advanced oxidation performance in various pilot UV/H2O2 reactor systems with MP- and LP- and DBD-UV lamps
| Autor: | Corine J. Houtman, E.F. Beerendonk, D.J.H. Harmsen, Roberta Hofman-Caris, B.A. Wols, Deborah H. Metz, Ton H. Knol |
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| Rok vydání: | 2012 |
| Předmět: |
Pollutant
business.industry Chemistry General Chemical Engineering Advanced oxidation process Photodissociation Analytical chemistry General Chemistry Dielectric barrier discharge Computational fluid dynamics Industrial and Manufacturing Engineering Collimated light Environmental Chemistry Water treatment Emission spectrum business |
| Zdroj: | Chemical Engineering Journal. 210:520-528 |
| ISSN: | 1385-8947 |
| DOI: | 10.1016/j.cej.2012.09.041 |
| Popis: | The UV/H2O2 advanced oxidation process is increasingly applied as a barrier against organic micro pollutants in drinking water treatment. Adequate modeling of the purification process, resulting in a reliable prediction of the reactor performance, would make it possible to optimize the operating parameters as a function of seasonal or diurnal fluctuations in the influent composition, and thus save energy while still guaranteeing safe drinking water. We recently developed two design tools to predict full scale performance of UV/H2O2 reactors: the UVPerox I and II models. UVPerox I is based on a kinetic model, describing both photolysis and oxidation. By means of Computational Fluid Dynamics (CFD) calculations of the reactor the UV dose distribution inside the reactor can be calculated, while the kinetic model gives the conversion as a function of the UV dose. UVPerox I is shown to be applicable to reactors equipped with Low Pressure (LP) or Dielectric Barrier Discharge (DBD) UV lamps, using a broad range of organic compounds, resulting in a |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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