High-resolution electron beam lithography for the fabrication of high-density dielectric metamaterials
| Autor: | A. Potts, B. R. Davidson, W. Zhang, Darren M. Bagnall |
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| Rok vydání: | 2007 |
| Předmět: |
Materials science
Proximity effect (electron beam lithography) Metals and Alloys Physics::Optics Metamaterial Nanotechnology Surfaces and Interfaces Computer Science::Other Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Resist law Materials Chemistry X-ray lithography Stencil lithography Photolithography Next-generation lithography Electron-beam lithography |
| Zdroj: | Thin Solid Films. 515:3714-3717 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2006.09.011 |
| Popis: | Electron beam lithography has been applied to the fabrication of nanoscale two-dimensional chiral structures with various designs. A fabrication process for planar chiral structures in a thin silicon nitride layer using electron beam lithography and dry etching is presented. A top conductive coating is applied during electron-beam exposure to prevent the occurrence of charging effects caused by the non-conductive silica substrate. Different doses are chosen during the lithography process depending on the complexities and densities of different chiral designs. A very well defined transmission diffraction pattern from arrays of Peano-Gosper fractals is obtained. The optical activity of these dielectric metamaterials shows great potential in their applications of optoelectronic devices and communications. |
| Databáze: | OpenAIRE |
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