Hexagonal nanostructures generated by light masks for neutral atoms

Autor: Tilman Pfau, J. Mlynek, M. Drewsen, Th. Schulze, U. Drodofsky, J. Stuhler, B. Brezger
Rok vydání: 1997
Předmět:
Zdroj: Applied Physics B: Lasers and Optics. 65:755-759
ISSN: 1432-0649
0946-2171
DOI: 10.1007/s003400050342
Popis: Cr, different patterns can be generated. Possible applications using the inherent properties of atom lithography, e.g. the fabrication of photonic bandgap material, are discussed.
Databáze: OpenAIRE