Hexagonal nanostructures generated by light masks for neutral atoms
Autor: | Tilman Pfau, J. Mlynek, M. Drewsen, Th. Schulze, U. Drodofsky, J. Stuhler, B. Brezger |
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Rok vydání: | 1997 |
Předmět: | |
Zdroj: | Applied Physics B: Lasers and Optics. 65:755-759 |
ISSN: | 1432-0649 0946-2171 |
DOI: | 10.1007/s003400050342 |
Popis: | Cr, different patterns can be generated. Possible applications using the inherent properties of atom lithography, e.g. the fabrication of photonic bandgap material, are discussed. |
Databáze: | OpenAIRE |
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