Microstructure of polycrystalline diamond film
| Autor: | M. G. Burke, R. E. Witkowski, R. T. Blackham |
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| Rok vydání: | 1990 |
| Předmět: | |
| Zdroj: | Proceedings, annual meeting, Electron Microscopy Society of America. 48:708-709 |
| ISSN: | 2690-1315 0424-8201 |
| Popis: | Diamond films have attracted considerable attention for use in a wide variety of industrial and commercial applications, particularly as coatings. Diamond coatings will enhance the performance of electro-optical systems, space-based photovoltaic power sources, packages for power electronic devices, and wear-limited processing equipment. These films are generally grown via plasma deposition or chemical vapor deposition techniques using a mixture. To characterize the as-grown diamond films, a variety of techniques including transmission electron microscopy are utilized. For this study, films were grown in a 1.5 kW ASTeX High Pressure Microwave Plasma Source equipped with an austenitic stainless steel, quartz lined reaction chamber. The plasma was a mixture of 0.5 or 2.0% CH4 in H2 at a reactor pressure of 30-50 mm Hg. During deposition, the substrate was heatea to ∼900-950°C. It has been reported that variations in the growth conditions will markedly affect the microstructure of the diamond film; several film morphologies have been observed. The quality of the substrate also exerts a strong effect on the nucleation of the diamond. In this on-going study, the influence of film thickness on the microstructure of polycrystalline diamond films has been characterized by analytical electron microscopy. |
| Databáze: | OpenAIRE |
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