Experimental and Theoretical Study of the Charge Build-Up in an ECR Etcher

Autor:	Morio Inoue, Takashi Namura, Yoshihiro Todokoro, Yasushi Naitoh, Hiroyuki Okada
Rok vydání:	1990
Předmět:	Materials science General Engineering Analytical chemistry General Physics and Astronomy Charge (physics) Plasma Engraving Electron cyclotron resonance Magnetic field Physics::Plasma Physics visual_art visual_art.visual_art_medium Equivalent circuit Wafer Atomic physics Current (fluid)
Zdroj:	Japanese Journal of Applied Physics. 29:2251
ISSN:	1347-4065 0021-4922
DOI:	10.1143/jjap.29.2251
Popis:	The charge build-up in an electron cyclotron resonance (ECR) etcher has been studied experimentally and theoretically. The experimental results show that the charge build-up profiles of the wafer are convex and positive, and are detected only when the RF bias exists. We have derived a simplified equivalent circuit model for the wafer in an ECR etcher. The charge build-up profile predicted with the simplified equivalent circuit model shows a good agreement with the experimental results. It is concluded that the variation of plasma potential caused by the radial RF current across the magnetic field results in the charge build-up.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::a3c66e10299d90a480f6ab4c5ce7e785 https://doi.org/10.1143/jjap.29.2251 Zobrazit plný text záznamu