| Autor: |
Jianshe Xue, Niu Jing, Bongkwan Jung, Shuang Sun, Seungjin Choi, Youngjin Song, Min-Sung Kang, Ki‐Yong Kim, Guanbao Hui, Zhang Fangzhen |
| Rok vydání: |
2013 |
| Předmět: |
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| Zdroj: |
SID Symposium Digest of Technical Papers. 44:1126-1129 |
| ISSN: |
0097-966X |
| DOI: |
10.1002/j.2168-0159.2013.tb06424.x |
| Popis: |
In this paper, we have successfully developed novel gray-toneless technology for mask reduction in high aperture rate FFS mode. The key processes are the gray-toneless technology and new PIC (pixel ITO plus channel) processes. These new technologies are able to protect channel area from pixel ITO processes and decrease defect rate of data line open due to having double layer structure. Also Panel quality was improved by reducing capacitance change between Pixel and Data line through PIC processes. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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