The sputtering of oxide-covered magnesium surfaces

Autor:	R. W. Ditchburn, K. I. Roulston
Rok vydání:	1938
Předmět:	Materials science Field (physics) Magnesium General Mathematics Analytical chemistry Oxide chemistry.chemical_element Oxygen Cathode Charged particle law.invention chemistry.chemical_compound chemistry law Sputtering Electric field
Zdroj:	Mathematical Proceedings of the Cambridge Philosophical Society. 34:620-624
ISSN:	1469-8064 0305-0041
DOI:	10.1017/s0305004100020648
Popis:	The rate of sputtering of magnesium in oxygen was observed with an apparatus which permitted the field immediately in front of the target to be reversed. Change in the sign of the field did not affect the rate of sputtering which remained abnormally low. It is therefore concluded that, while the low rate is in some way due to the presence of an oxide film, it is not due to charged particles being returned to the cathode by the electric field, as had been suggested by other workers.
Databáze:	OpenAIRE
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