Coupling coefficient modulated distributed feedback gratings with E-beam lithography
| Autor: | J.J.M. Binsma, Martinus Johannes Verheijen, H. R. J. R. van Helleputte |
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| Rok vydání: | 1994 |
| Předmět: |
Materials science
business.industry Single-mode optical fiber Physics::Optics Condensed Matter Physics Laser Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Optics law Modulation Chirp Optoelectronics Physics::Atomic Physics Electrical and Electronic Engineering business Order of magnitude Coupling coefficient of resonators Electron-beam lithography |
| Zdroj: | Microelectronic Engineering. 23:473-476 |
| ISSN: | 0167-9317 |
| Popis: | A new approach for the electron-beam exposure of DFB gratings has been developed, based on a proximity ghost exposure. The modulation of the gratings can easily be adapted by using this method. Exposure times are decreased an order of magnitude compared to a straightforward approach. 15-wavelength CCM-DFB laser arrays are fabricated showing good results in terms of single mode operation and chirp. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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