Fabrication and characterization of IC-Compatible Linear Variable Optical Filters with application in a micro-spectrometer
| Autor: | H. Wu, Arvin Emadi, S. Grabarnik, G. de Graaf, Reinoud F. Wolffenbuttel, José Higino Correia, Peter Enoksson, Karin Hedsten |
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| Rok vydání: | 2010 |
| Předmět: |
Fabrication
Materials science business.industry Metals and Alloys 02 engineering and technology 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Surfaces Coatings and Films Electronic Optical and Magnetic Materials 010309 optics Optics Resist Etching (microfabrication) Dielectric mirror 0103 physical sciences Wafer Electrical and Electronic Engineering Thin film 0210 nano-technology Optical filter business Instrumentation Lithography |
| Zdroj: | Sensors and Actuators A: Physical. 162:400-405 |
| ISSN: | 0924-4247 |
| DOI: | 10.1016/j.sna.2010.04.029 |
| Popis: | This paper reports on an IC-Compatible process for the fabrication of Linear Variable Optical Filter (LVOF). The LVOF is integrated with a detector array to result in a micro-spectrometer. The technological challenge in fabrication of an LVOF is fabrication of a well-controlled tapered cavity layer. Very small taper angles, ranging from 0.001 degrees to 0.1 degrees. are fabricated in a resist layer by just one lithography step and a subsequent reflow process. The 3D pattern of resist structures is subsequently transferred into SiO2 by an appropriate etching. Complete LVOF fabrication involves CMOS-compatible deposition of a lower dielectric mirror using a stack of dielectrics on the wafer, tapered layer formation and the deposition of the top dielectric mirror. The design principle, IC-Compatible processing and the characterization results on fabricated LVOFs are presented. (C) 2010 Elsevier B.V. All rights reserved. |
| Databáze: | OpenAIRE |
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