Impact of Stack Structure Control and Ferroelectric Material Optimization in Novel Laminate HSO and HZO MFMIS FeFET

Autor:	T. Ali, K. Mertens, R. Olivo, D. Lehninger, M. Lederer, F. Muller, M. Rudolph, S. Oehler, K. Kuhnel, R. Hoffmann, P. Schramm, M. Czernohorsky, T. Kampfe, K. Seidel
Rok vydání:	2022
Zdroj:	2022 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA).
DOI:	10.1109/vlsi-tsa54299.2022.9771003
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::a171588fbf8695036f529ce4fde8693d https://doi.org/10.1109/vlsi-tsa54299.2022.9771003 Zobrazit plný text záznamu