Experiments and computer simulation of submicron image formation by direct V U V photoetching

Autor:	L. V. Velikov, A. S. Kramarenko, G S Volkov, A. I. Maslakov, K. A. Valiev
Rok vydání:	1985
Předmět:	Image formation Materials science Optics business.industry Electrical and Electronic Engineering Condensed Matter Physics business Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials
Zdroj:	Microelectronic Engineering. 3:339-347
ISSN:	0167-9317
DOI:	10.1016/0167-9317(85)90044-9
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9fa3cad6bea9ca0be6f4ebd8a8bebe81 https://doi.org/10.1016/0167-9317(85)90044-9 Zobrazit plný text záznamu