Advancing 2D Monolayer CMOS Through Contact, Channel and Interface Engineering

Autor:	K. P. O'Brien, C. J. Dorow, A. Penumatcha, K. Maxey, S. Lee, C. H. Naylor, A. Hsiao, B. Holybee, C. Rogan, D. Adams, T. Tronic, S. Ma, A. Oni, A. Sen Gupta, R. Bristol, S. Clendenning, M. Metz, U. Avci
Rok vydání:	2021
Zdroj:	2021 IEEE International Electron Devices Meeting (IEDM).
DOI:	10.1109/iedm19574.2021.9720651
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9f7c4d5df1f1b4fe2c57eca27d492c81 https://doi.org/10.1109/iedm19574.2021.9720651 Zobrazit plný text záznamu