Influence of oxygen background pressure on crystalline quality of SrTiO3 films grown on MgO by pulsed laser deposition

Autor:	K. Jagannadham, Ramki Kalyanaraman, John D. Budai, Katharine Dovidenko, Jagdish Narayan, Serge Oktyabrsky, Nalin R. Parikh, R. D. Vispute, A. Suvkhanov
Rok vydání:	1997
Předmět:	Full width at half maximum Crystallography Materials science Physics and Astronomy (miscellaneous) Transmission electron microscopy X-ray crystallography Analytical chemistry Heterojunction Partial pressure Thin film Epitaxy Pulsed laser deposition
Zdroj:	Applied Physics Letters. 71:1709-1711
ISSN:	1077-3118 0003-6951
DOI:	10.1063/1.120011
Popis:	We have systematically investigated the effect of oxygen partial pressure (PO2) on the crystalline quality of SrTiO3 films grown on MgO (001) substrates using pulsed laser deposition and established optimized conditions for the growth of high-quality epitaxial films. The crystalline quality is found to improve significantly in the O2 pressure range of 0.5–1 mTorr, compared to the films deposited at higher pressures of 10–100 mTorr. The x-ray diffraction rocking curves for the films grown at PO2 of 1 mTorr and 100 mTorr yielded full width at half-maximum (FWHM) of 0.7° and 1.4°, respectively. The in-plane x-ray φ scans showed epitaxial cube-on-cube alignment of the films. Channeling yields χmin were found to be
Databáze:	OpenAIRE
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