Simulation study of zone-height limit by electron beam lithography for 30 nm Fresnel zone plates in X ray optics

Autor:	Qiucheng Chen, Chengyang Mu, Xujie Tong, Jun Zhao, Qingxin Wu, Yifang Chen
Rok vydání:	2023
Předmět:	Electrical and Electronic Engineering Condensed Matter Physics Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials
Zdroj:	Microelectronic Engineering. 273:111965
ISSN:	0167-9317
DOI:	10.1016/j.mee.2023.111965
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9ba19e057837eca035412c55592b8407 https://doi.org/10.1016/j.mee.2023.111965 Zobrazit plný text záznamu Full Text from ScienceDirect