Development of local ambient gas control technologies for atmospheric MEMS process

Autor:	Toshihiro Itoh, Takashi Tokunaga, Teruki Naito, Konno Nobuaki
Rok vydání:	2013
Předmět:	Glow discharge Explosive material Chemistry Analytical chemistry Atmospheric-pressure plasma Plasma Condensed Matter Physics Gas analyzer Electronic Optical and Magnetic Materials Hardware and Architecture Impurity Plasma diagnostics Electrical and Electronic Engineering Flammability limit
Zdroj:	Microsystem Technologies. 19:829-835
ISSN:	1432-1858 0946-7076
DOI:	10.1007/s00542-013-1761-8
Popis:	We report on a local ambient gas control technologies for atmospheric pressure plasma process using our new curtain gas structure. First, local ambient gas control with the curtain gas structure was investigated by computational fluid dynamic code. After confirmation of the feasible cleanness level with this structure, which is comparable to impurity level in semiconductor grade material gas (below 1 ppm), we fabricated a prototype apparatus. Measuring gas distribution by a gas analyzer, local ambient gas control was confirmed experimentally. Next, we attempted H 2 /He plasma generation in open air with H 2 concentration even above explosive limit in air (4.1 %) and achieved stable glow discharge with H 2 concentration of 0–40 %. In addition, reduction of copper oxides was demonstrated by H2 plasma exposure. These results show high potential of our method for atmospheric MEMS processes.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9a5c6a74c3fae5c82729440f4ef97d9c https://doi.org/10.1007/s00542-013-1761-8 Zobrazit plný text záznamu Full text from SpringerLink