The first stages in the formation of ultrathin nickel layers on Ag(111): A low energy electron diffraction-Auger electron spectroscopy study
| Autor: | M.-G. Barthès, A. Rolland |
|---|---|
| Rok vydání: | 1981 |
| Předmět: |
inorganic chemicals
Auger electron spectroscopy Low-energy electron diffraction Chemistry Diffusion Metals and Alloys Analytical chemistry chemistry.chemical_element Surfaces and Interfaces Substrate (electronics) Surfaces Coatings and Films Electronic Optical and Magnetic Materials Auger Nickel Materials Chemistry Layer (electronics) Deposition (law) |
| Zdroj: | Thin Solid Films. 76:45-52 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/0040-6090(81)90064-x |
| Popis: | The slow deposition of nickel vapour onto a clean Ag(111) substrate was observed by quantitative Auger electron spectroscopy and by low energy electron diffraction. At ambient substrate temperature the variations of the Auger signals as a function of time, at constant vapour flux, indicate a “simultaneous multilayer” growth mode in which each successive nickel layer begins to grow before completion of the preceding layer. A model of this process is described. At a higher temperature (≈ 520 K) a different behaviour is observed, probably owing to the diffusion of silver into the nickel layer. A comparison is made with results obtained by equilibrium segregation of radioactive nickel. |
| Databáze: | OpenAIRE |
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