Ion assisted deposition of α-Al2O3 coatings by anodic evaporation in the arc discharge
| Autor: | P. V. Tretnikov, N. V. Gavrilov, Andrey V. Chukin, A. S. Kamenetskikh |
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| Rok vydání: | 2018 |
| Předmět: |
010302 applied physics
Materials science chemistry.chemical_element Biasing 02 engineering and technology Surfaces and Interfaces General Chemistry Substrate (electronics) 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Evaporation (deposition) Surfaces Coatings and Films Ion Anode Electric arc chemistry Chemical engineering Aluminium 0103 physical sciences Materials Chemistry 0210 nano-technology Deposition (law) |
| Zdroj: | Surface and Coatings Technology. 337:453-460 |
| ISSN: | 0257-8972 |
| DOI: | 10.1016/j.surfcoat.2018.01.058 |
| Popis: | Alumina coatings are deposited in an arc discharge by the method of reactive thermal anodic evaporation of aluminum with intensive ion assistance. The influence of the bias voltage and the ion current density on the structure and properties of the α-Al2O3 coatings, deposited on a stainless steel substrate with an isostructural Cr2O3 sublayer at 600 °C, was studied. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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