Whole-Chip Delayering for Failure Analysis and Quality Assurance

Autor: David Douglass, Kyle Godin
Rok vydání: 2023
Předmět:
Zdroj: EDFA Technical Articles. 25:4-8
ISSN: 1537-0755
DOI: 10.31399/asm.edfa.2023-2.p004
Popis: Broad ion beam delayering is a versatile technique for whole-chip failure analysis. The large area of uniformity coupled with the ability to precisely stop at the layer of interest facilitates repeatable, rapid defect detection anywhere on the chip.
Databáze: OpenAIRE