Rotating Target Source: Novel Shaperless Concept for Magnetron Sputtering with Excellent Uniformity

Autor:	Silvia Schwyn Thoeny, Michael Chesaux, Silvio Gees, Andreas Frigg
Rok vydání:	2016
Předmět:	Amorphous silicon Materials science business.industry Flux Nanotechnology Sputter deposition Magnetic field chemistry.chemical_compound Optics chemistry Band-pass filter White light Wafer business
Zdroj:	Optical Interference Coatings 2016.
DOI:	10.1364/oic.2016.wa.2
Popis:	In this novel approach the distribution of the sputtered flux is tailored by careful adjustment of the magnetic field intensity. Target usage is improved by rotating the disk shaped target. Uniformities
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::904dd5b9fa55529d0c6e3a7a7243238f https://doi.org/10.1364/oic.2016.wa.2 Zobrazit plný text záznamu