Toluene adsorption on Si()7×7 studied by synchrotron-radiation photoemission

Autor:	Geneviève Comtet, Maria Novella Piancastelli, M. P. Casaletto, Gérald Dujardin, Roberto Zanoni, L. Hellner, Marilena Carbone
Rok vydání:	2002
Předmět:	Silicon Thermal desorption Analytical chemistry chemistry.chemical_element Surfaces and Interfaces Condensed Matter Physics Toluene Surfaces Coatings and Films chemistry.chemical_compound Adsorption chemistry X-ray photoelectron spectroscopy Chemisorption Desorption Materials Chemistry Methyl group
Zdroj:	Surface Science. 498:186-192
ISSN:	0039-6028
DOI:	10.1016/s0039-6028(01)01691-0
Popis:	The toluene adsorption on Si(1 1 1)7×7 was studied by valence band synchrotron-radiation photoemission at room temperature as a function of exposure and time. We found that the adsorption process occurs preferentially on rest atoms and that toluene adsorption is time dependent, since the adsorption features disappear and the rest atoms related feature re-appears as a function of time. The features time evolution is quadratic, hinting at a thermal desorption process. The high desorption rate allows us to rule out a dissociative adsorption involving the methyl group. Our conclusion is that toluene is molecularly π-bonded through the aromatic electrons on silicon rest atoms.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::8dc1d7b97dbab8ff0d739a7e59523680 https://doi.org/10.1016/s0039-6028(01)01691-0 Zobrazit plný text záznamu Full Text from ScienceDirect