Multi-layer resist system for 45-nm-node and beyond: part I

Autor:	M. Hashimoto, H. Shiratori, K. Horii, Y. Yokoya, Y. Ohkubo, H. Takamizawa, Y. Fujimura, J. Morimoto, A. Manoshiro, M. Shimizu, T. Yokoyama, T. Enomoto, M. Nagai
Rok vydání:	2006
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.693131
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::8c65e0e95ec8145e091345e14a75a1e4 https://doi.org/10.1117/12.693131 Zobrazit plný text záznamu