On problems of reaction kinetics during deposition of silicon oxide films by reactive sputtering of silicon in a magnetron sputtering system

Autor:	W. Brodkorb, J. Salm, Ch. Steinbeiss, E. Steinbeiss
Rok vydání:	1980
Předmět:	Materials science Silicon business.industry chemistry.chemical_element Sputter deposition Condensed Matter Physics Electronic Optical and Magnetic Materials Chemical kinetics chemistry Sputtering Optoelectronics High-power impulse magnetron sputtering business Silicon oxide Deposition (chemistry)
Zdroj:	Physica Status Solidi (a). 57:K49-K53
ISSN:	1521-396X 0031-8965
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::8bcff048367e736c3c377440fdf4e391 https://doi.org/10.1002/pssa.2210570164 Zobrazit plný text záznamu Plný text