Electrical and luminescence properties of Mg‐doped p‐type GaPN grown by molecular beam epitaxy
Autor: | K. Umeno, S. Mitsuyoshi, Akihiro Wakahara, Yuzo Furukawa, Hiroo Yonezu, Noriyuki Urakami |
---|---|
Rok vydání: | 2010 |
Předmět: | |
Zdroj: | physica status solidi c. 7:2498-2501 |
ISSN: | 1610-1642 1862-6351 |
DOI: | 10.1002/pssc.200983851 |
Popis: | We have demonstrated the acceptor concentration control for p-type GaPN grown by molecular beam epitaxy (MBE) using Mg as the acceptor element. The hole concentration increases up to 2×1019 cm-3 at 300 K and does not remarkably vary after thermal treatment and thus Mg is successfully doped into GaPN. Subsequently, we have investigated the electrical and luminescence properties of Mg-doped p-type GaPN grown by MBE. The activation energy is estimated to be about 37 meV, indicating Mg is a shallow acceptor element for p-type GaPN grown by MBE. When the hole concentration is larger than ∼1018 cm-3, the photoluminescence (PL) intensity decreases with increasing the hole concentration. By time-resolved PL (TRPL) measurement, this PL quenching is caused by the non-radiative centres due to Mg doping when the hole concentration is larger than ∼1018 cm-3. (© 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim) |
Databáze: | OpenAIRE |
Externí odkaz: |