Effect of Argon Deposition Pressure on the Properties of Aluminum-Doped ZnO Films Deposited Layer-By-Layer Using Magnetron Sputtering
| Autor: | M. V. Dranchuk, G.V. Lashkarov, V. A. Karpyna, L. O. Klochkov, M.G. Dushejko, V.R. Romanjuk, V. A. Baturyn, O.Y. Karpenko, A. I. Ievtushenko, V. M. Tkach, O. S. Lytvyn, V.I. Popovych |
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| Rok vydání: | 2016 |
| Předmět: |
010302 applied physics
Argon Materials science Deposition pressure Doping Layer by layer General Physics and Astronomy chemistry.chemical_element 02 engineering and technology Sputter deposition 021001 nanoscience & nanotechnology 01 natural sciences chemistry Aluminium 0103 physical sciences Composite material 0210 nano-technology |
| Zdroj: | Ukrainian Journal of Physics. 61:325-330 |
| ISSN: | 2071-0194 2071-0186 |
| DOI: | 10.15407/ujpe61.04.0325 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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