Advanced indium tin oxide ceramic sputtering targets (rotary and planar) for transparent conductive nanosized films
| Autor: | Olga Yankov, P. Lippens, Christopher J. Szepesi, Eugene Medvedovski, N A Alvarez |
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| Rok vydání: | 2013 |
| Předmět: |
Materials science
business.industry Metallurgy Tin oxide Industrial and Manufacturing Engineering Nanocrystalline material Amorphous solid Indium tin oxide Sputtering visual_art Ceramics and Composites visual_art.visual_art_medium Optoelectronics Ceramic Thin film business Transparent conducting film |
| Zdroj: | Advances in Applied Ceramics. 112:243-256 |
| ISSN: | 1743-6761 1743-6753 |
| DOI: | 10.1179/1743676112y.0000000066 |
| Popis: | AbstractIndium tin oxide (ITO) ceramic sputtering targets used for the manufacturing of transparent conductive thin films for electrodes in flat panel displays, solar cells, touch panels, antistatic films and others developed and commercially produced are described. Thanks to optimised compositions and developed technology, commercially producing large size planar and new generation rotary ceramic target components have high density (up to 99·5% of theoretical density), uniform microcrystalline structure and superior properties, e.g. low electrical resistivity. As a result, nanosized thin films produced by direct current magnetron sputtering from the developed targets have uniform nanocrystalline or amorphous structures and superior transmittance (>90%) and low electrical resistivity. The morphology and properties of these films have been studied, depending on the film processing features. The benefits of the developed ITO rotary targets for industrial nanosized film processing (e.g. significant i... |
| Databáze: | OpenAIRE |
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