Characterisation of thin SiOx-layers on float glass deposited by Combustion Chemical Vapour Deposition (C-CVD)
| Autor: | Ralf Linke, Bernd Grünler, Thomas Struppert, Paul Rüffer, Andreas Heft |
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| Rok vydání: | 2013 |
| Předmět: |
Inert
Glass production Materials science business.industry Metallurgy Float glass Surfaces and Interfaces General Chemistry Chemical vapor deposition engineering.material Condensed Matter Physics Combustion Surfaces Coatings and Films Corrosion law.invention Coating law Materials Chemistry engineering business Silicon oxide |
| Zdroj: | Surface and Coatings Technology. 232:582-586 |
| ISSN: | 0257-8972 |
| DOI: | 10.1016/j.surfcoat.2013.06.031 |
| Popis: | Float glass is not an inert material with non-improvable chemical durability as often perceived. Its corrosion starts whenever it becomes exposed to humidity. This process begins already immediately after production. In this paper we will demonstrate that the initial stage of float glass corrosion – ion diffusion (especially Na + ) to the glass surface – can be inhibited by depositing silicon oxide layers (SiO x ) of approximately 50 nm thickness on the float glass surface using an atmospheric pressure coating method: Combustion Chemical Vapour Deposition (C-CVD). |
| Databáze: | OpenAIRE |
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