Simulation of field emission from volcano-gated tips for scanning probe lithography
Autor: | Marcus Kaestner, Ivo W. Rangelow, Steve Lenk, Claudia Lenk |
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Rok vydání: | 2017 |
Předmět: |
010302 applied physics
Materials science business.industry Resolution (electron density) 02 engineering and technology Electron 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Field electron emission Nanolithography Optics 0103 physical sciences Electrical and Electronic Engineering 0210 nano-technology business Lithography Throughput (business) Scanning probe lithography Electron-beam lithography |
Zdroj: | Microelectronic Engineering. 177:19-24 |
ISSN: | 0167-9317 |
Popis: | Throughput and resolution in serial lithographic methods are naturally two competing goals - improving one leads to a deterioration of the other. This is also valid for field emission based scanning probe lithography FE-SPL), wherein low-energetic electrons ( |
Databáze: | OpenAIRE |
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