Advancing high resolution photolithography with hybrid polymers for wafer-scale manufacture of micro-optics and patterned passivation layers
| Autor: | Matthias F. Koch, Maria Russew, Ludwig Scharfenberg, Andreas Benker, Arne Schleunitz, Gabi Grützner |
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| Rok vydání: | 2023 |
| Zdroj: | Novel Patterning Technologies 2023. |
| DOI: | 10.1117/12.2658408 |
| Databáze: | OpenAIRE |
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