A novel methodology for wafer-level scanner focus spot capture and back-tracing mechanism

Autor:	Ethan Chiu, Mingqi Gao, feng Tian, Wei Feng, Andy Lan, Dan Li, Shengyuan zhong, Aijiao zhu, Ningqi Zhu, yunchen Xu, Jin Zhu, jincheng Pei, Kevin Huang
Rok vydání:	2022
Zdroj:	Metrology, Inspection, and Process Control XXXVI.
DOI:	10.1117/12.2627284
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::773adf6efff0cf3529f97bb1b6d28510 https://doi.org/10.1117/12.2627284 Zobrazit plný text záznamu