On Mechanism of Internal Stresses Formation in Electrodeposited Co-based Alloy Films with Columnar Structure

Autor:	T. A. Tochitskii, V. G. Shadrov, A. V. Boltushkin
Rok vydání:	1991
Předmět:	Materials science Alloy Metallurgy Stacking General Chemistry engineering.material Condensed Matter Physics law.invention Impurity law Ultimate tensile strength engineering General Materials Science Texture (crystalline) Crystallite Compression (geology) Composite material Crystallization
Zdroj:	Crystal Research and Technology. 26:925-929
ISSN:	1521-4079 0232-1300
DOI:	10.1002/crat.2170260721
Popis:	The internal stresses formed in electrodeposited Co-based alloy films with columnar structure have been investigated. It is shown that the sign and the value of the stresses are determined by the texture, amount of the adsorbed impurities (CoO and Co(OH)2) and character of their incorporation in the deposit. A preferable crystallite incorporation of the impurities promotes the formation of the tensile stresses through the substraction stacking faults formation. With the crystalline incorporation decreasing, the compression stresses mechanism, caused by the crystallization pressure prevails. Russian text ignore.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::767582c502929de3dd7aeaeade2b99bf https://doi.org/10.1002/crat.2170260721 Zobrazit plný text záznamu Plný text