High quality textured ZnO:Al surfaces obtained by a two-step wet-chemical etching method for applications in thin film silicon solar cells
| Autor: | S. Fernández, O. de Abril, F.B. Naranjo, J.J. Gandía |
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| Rok vydání: | 2011 |
| Předmět: |
Materials science
Silicon Renewable Energy Sustainability and the Environment business.industry fungi technology industry and agriculture chemistry.chemical_element Hydrochloric acid macromolecular substances Isotropic etching Light scattering Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry.chemical_compound Quality (physics) Optics stomatognathic system chemistry Etching (microfabrication) Optoelectronics Reactive-ion etching Thin film business |
| Zdroj: | Solar Energy Materials and Solar Cells. 95:2281-2286 |
| ISSN: | 0927-0248 |
| Popis: | ZnO:Al films deposited at 250 °C on Corning glass by radio frequency magnetron sputtering were studied for their use as front contact for thin film silicon solar cells. For this purpose, a two-step etching method combining different concentrations of diluted hydrochloric acid (from 0.1% to 3%) with different etching times was developed. Its influence on morphological, electrical and optical properties of the etched films was evaluated. This new etching method led to more uniform textured surfaces, where the electrical properties remained unchangeable after the etching process, and with adapted light scattering properties similar to those exhibited by commercial substrates. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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