Comparison of the selective adsorption and reactivity behavior of WF6and TaF5on SiO2and polyimide surfaces

Autor:	Louis J. Terminello, S. P. Kowalczyk, F. R. McFeely
Rok vydání:	1990
Předmět:	Surface coating Adsorption Physics and Astronomy (miscellaneous) X-ray photoelectron spectroscopy Chemical engineering Chemistry Selective adsorption Inorganic chemistry Molecule Reactivity (chemistry) Chemical vapor deposition Polyimide
Zdroj:	Applied Physics Letters. 57:667-669
ISSN:	1077-3118 0003-6951
DOI:	10.1063/1.104254
Popis:	The initial stages of WF6 and TaF5 adsorption on SiO2 and polyimide surfaces were investigated by photoelectron spectroscopy. WF6 selectively adsorbs on Si relative to SiO2 and polyimide, while TaF5 exhibited nonselective adsorption behavior. This trend is explained by differences in molecular structure and suggests a general basis for predicting selective deposition.
Databáze:	OpenAIRE
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