Chemography of silicon surfaces
| Autor: | Ilan A. Blech, Michael H. Herman, Eugene S. Meieran |
|---|---|
| Rok vydání: | 1985 |
| Předmět: | |
| Zdroj: | Journal of Applied Physics. 57:516-520 |
| ISSN: | 1089-7550 0021-8979 |
| DOI: | 10.1063/1.334785 |
| Popis: | Recently, it has been shown that images can be formed in darkness by placing surfaces of silicon or other materials in contact with sensitive photographic films such as Ilford Nuclear Emulsion G5 or L4. These ‘‘chemographic’’ images are observed by developing the emulsion after a suitable period of exposure. The time required for image formation depends upon the nature of the surface to be imaged and the humidity of the exposing environment. Freshly etched or abraded Si surfaces, exposed to films in moist atmospheres, may require only hours of exposure, while heavily oxidized Si surfaces, exposed in drier atmospheres, may require days or weeks to generate chemographic images. These observations are consistent with previous studies which suggest that atomic hydrogen, created during the silicon oxidation process, is responsible for image formation. In this paper, some effects of surface properties on the strength of the chemographic images are discussed. In particular, images of twinned crystals show the de... |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|