Gas-phase diagnostics during H2 and H2O plasma treatment of SnO2 nanomaterials: Implications for surface modification
| Autor: | Erin P. Stuckert, Christopher J. Miller, Ellen R. Fisher |
|---|---|
| Rok vydání: | 2017 |
| Předmět: |
010302 applied physics
Materials science Plasma parameters Process Chemistry and Technology Analytical chemistry Nanoparticle chemistry.chemical_element 02 engineering and technology Plasma 021001 nanoscience & nanotechnology 01 natural sciences Oxygen Surfaces Coatings and Films Electronic Optical and Magnetic Materials Nanomaterials Chemical engineering chemistry 0103 physical sciences Oxidizing agent Materials Chemistry Surface modification Electrical and Electronic Engineering 0210 nano-technology Instrumentation Plasma processing |
| Zdroj: | Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 35:021802 |
| ISSN: | 2166-2754 2166-2746 |
| DOI: | 10.1116/1.4976534 |
| Popis: | Although H2O plasmas are commonly used to enhance the surface oxygen content of various materials, our prior study found that H2O plasma modification of SnO2 nanomaterials resulted in reduction of Sn+4 to Sn0. To further explore this phenomenon and develop a deeper understanding of the mechanism for this behavior, gas-phase species were detected via optical emission spectroscopy during H2O plasma processing (nominally an oxidizing environment), both with and without SnO2 substrates in the reactor. Gas-phase species were also detected in the reducing environment of H2 plasmas, which provided a comparative system without oxygen. Sn* and OH* appear in the gas phase in both plasma systems when SnO2 nanowire or nanoparticle substrates are present, indicative of SnO2 etching. Furthermore, H2 and H2O plasmas reduced the Sn in both nanomaterial morphologies. Differences in H* and OH* emission intensities as a function of plasma parameters show that plasma species interact differently with the two SnO2 morphologie... |
| Databáze: | OpenAIRE |
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