Fabrication of a high uniformity Mo/Si multilayer with a diameter of 120 mm using magnetron sputtering technology

Autor:	李宏杰 Li Hongjie, 朱京涛 Zhu Jingtao, 张众 Zhang Zhong, 王晓强 Wang Xiaoqiang, 潘磊 Pan Lei, 王占山 Wang Zhangshan, 王道荣 Wang Daorong, 赵巨岩 Zhao Juyan, 李乙洲 Li Yizhou, 陆伟 Lu Wei
Rok vydání:	2010
Předmět:	Fabrication Materials science business.industry Optoelectronics Electrical and Electronic Engineering Sputter deposition business Atomic and Molecular Physics and Optics
Zdroj:	High Power Laser and Particle Beams. 22:1535-1538
ISSN:	1001-4322
DOI:	10.3788/hplpb20102207.1535
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::67d94857c7e40c792a7e9dd557ae4876 https://doi.org/10.3788/hplpb20102207.1535 Zobrazit plný text záznamu